Focused Ion Beam nano-patterning from traditional applications to single ion implantation perspectives

Focused Ion Beam Nano-structuring for Applications in Photonics

To date, nano-and micro-structuring has commonly been implemented by a combination of specifically optimized processes of electron-beam lithography and reactive ion etching, thus limiting the range of materials that can be structured to only a few. In this talk we will introduce focused ion beam (FIB) milling as an emerging technology that enables fast, reliable and well-controlled nanometer-si...

Nanometer scale patterning using focused ion beam milling

Publisher's copyright statement: Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (Petit, D. and Faulkner, C. C. and Johnstone, S. and Wood, D. and Cowburn, R. P. (2005) Nanometer scale patterning using focused ion be...

Focused Ion Beam Lithography

Focused Ion Beam Based Three-Dimensional Nano-Machining

In recent days, the micro/nano machining becomes an important process to fabricate micro/nano scale dimensional patterns or devices for many applications, especially in electrical and electronic devices. There are two kinds micro-machining in use. i) bulk micromachining, ii) surface micro-maching. In the case of bulk micromaching, the structures can be made by etching inside a substrate selecti...

High-brightness Cs focused ion beam from a cold-atomic-beam ion source

We present measurements of focal spot size and brightness in a focused ion beam system utilizing a laser-cooled atomic beam source of Cs ions. Spot sizes as small as (2.1 ± 0.2) nm (one standard deviation) and reduced brightness values as high as (2.4 ± 0.1) × 107 A m-2 Sr-1 eV-1 are observed with a 10 keV beam. This measured brightness is over 24 times higher than the highest brightness observ...